Apparent roadblock in the development of quantum lithography

(PhysOrg.com) — Just when it began to appear that scientists had found a viable way around the problem of the blurring that occurs when using masks to create smaller and smaller silicon wafers for computer chips, a previous study on beam splitting optics showed that the new approach would not work, at least as it has thus far been proposed. A group of researchers explain why in a paper in New Journal of Physics.

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Apparent roadblock in the development of quantum lithography