(PhysOrg.com) -- A new chemical technique for depositing a non-crystalline form of silicon into the long, ultra-thin pores of optical fibers has been developed by an international team of scientists in the United States and the United Kingdom. The technique, which is the first of its kind to use high-pressure chemistry for making well-developed films and wires of this particular kind of silicon semiconductor, will help scientists to make more-efficient and more-flexible optical fibers. The findings, by an international team led by John Badding, a professor of chemistry at Penn State University, will be published in a future print edition of the Journal of the American Chemical Society.
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