Rapid etching X-rayed: Physicists unveil processes during fast chemical dissolution

A breakthrough in the study of chemical reactions during etching and coating of materials was achieved by a research group headed by Kiel physicist, Professor Olaf Magnussen. The team from the Christian-Albrechts-Universitat zu Kiel (CAU), Germany, in collaboration with staff from the European Synchrotron Radiation Facility (ESRF) in Grenoble, France, have uncovered for the first time just what happens in manufacturing processes, used for the formation of metal contacts thinner than a human hair in modern consumer electronics, such as flat-screen television. The results appear as the cover feature in the current issue of the renowned Journal of the American Chemical Society.

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Rapid etching X-rayed: Physicists unveil processes during fast chemical dissolution